I understand the dual layout system fairly well. I have used it, and read about it quite a bit. It does somehow stop short of explaining everything, which is why I posed the question.
If you look at the Hammer Gas Mask drilling sheet, and look at drilling #4
http://www.hammerbowling.com/res/uploads/resources/CTNH-043_Asymmetric_Core_Drill_Sheet_3.pdfIt gives the slightly vague explanation of "place the mass bias near the track". I was simply trying to ask what effect that has. I think it would be possible to put the MB near or on the track and have a drilling angle of more than 90 degrees, which is forbidden (not recommended), in the dual angle description. With say a PAP that is up an inch, and a Pin in the grip center.
So I agree that for a "lot" of PAP measurements this will lead to a large drilling angle, and more length, but there appears to be something else. As in a physical constraint that past the bowlers track will cause the ball to flare the other way. As if the MB would move the "other way" toward the track, yet being on the track provides nowhere for it to move to ... as in putting the Major pin on someone's track.
So I was kind of asking, and apparently not very well, how does putting the MB near or on the track smooth out the reaction? Does is circumvent it's purpose by basically not migrating ... hence making it behave more like a symmetric ball? What if the placement is slightly past the bowler's track, can that cause big problems, like reverse flare?